Comparative concentration analysis of Cr and Co in FeSi2 films performed by ERDA and RBS

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 161, Issue , 2000, Pages 467-470

  Bohne, W ^a   Reinsperger, G U ^a   Rohrich J ^a   Roschert G ^a   Selle, B ^a   Stauss P ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ANALYSIS; CHROMIUM; COBALT; COMPOSITION; MOLECULAR BEAM EPITAXY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON COMPOUNDS; THIN FILMS;

CONCENTRATION ANALYSIS; SILICIDE;

ION BEAMS;

EID: 0033872481     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00932-5     Document Type: Article

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