Atomic flux divergence in bamboo line for predicting initial formation of voids and hillocks

Theoretical and Applied Fracture Mechanics

Volumn 33, Issue 1, 2000, Pages 67-72

  Sasagawa, K ^a   Hasegawa, M ^b   Saka, M ^b   Abe H ^b  

^a HIROSAKI UNIVERSITY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; ELECTRIC CURRENT DISTRIBUTION; TEMPERATURE DISTRIBUTION;

ATOMIC FLUX DIVERGENCE (AFD);

ELECTROMIGRATION;

EID: 0033870955     PISSN: 01678442     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-8442(99)00052-X     Document Type: Article

References (7)

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3. K. Sasagawa, K. Naito, M. Saka, H. Abé, Prediction of electromigration failure in bamboo lines, in: Advances in Electronic Packaging 1999, ASME EEP Vol. 26-1, 1999, pp. 233-238.
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