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Volumn 26, Issue , 1999, Pages

Verification of a governing parameter for electromigration damage in bamboo lines

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL METHODS; CURRENT DENSITY; ELECTROMIGRATION; INTEGRATED CIRCUIT LAYOUT; INTEGRATED CIRCUIT TESTING; TEMPERATURE DISTRIBUTION;

EID: 0342298372     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (2)

References (7)
  • 2
    • 0003354983 scopus 로고
    • Atomistic and computer modeling of metallization failure of integrated circuits by electromigration
    • Kirchheim, R. and Kaeber, U., 1991, "Atomistic and Computer Modeling of Metallization Failure of Integrated Circuits by Electromigration," Journal of Applied Physics, Vol. 70, No. 1, pp. 172-181.
    • (1991) Journal of Applied Physics , vol.70 , Issue.1 , pp. 172-181
    • Kirchheim, R.1    Kaeber, U.2
  • 3
    • 0001531125 scopus 로고
    • Thermal conductivity and interface thermal resistance of Si film on Si substrate determined by photothermal displacement interferometry
    • Kuo, B. S. W., Li, J. C. M. and Schmid, A. W., 1992, "Thermal Conductivity and Interface Thermal Resistance of Si Film on Si Substrate Determined by Photothermal Displacement Interferometry" Applied Physics, A55, pp. 289-296.
    • (1992) Applied Physics , vol.A55 , pp. 289-296
    • Kuo, B.S.W.1    Li, J.C.M.2    Schmid, A.W.3
  • 4
    • 58149209837 scopus 로고
    • Current density and temperature distributions near the corner of angled metal line
    • Sasagawa, K., Saka, M. and Abé, H., 1995, "Current Density and Temperature Distributions Near the Corner of Angled Metal Line," Mechanics Research Communications., Vol.22, No5, pp. 473-483.
    • (1995) Mechanics Research Communications. , vol.22 , Issue.5 , pp. 473-483
    • Sasagawa, K.1    Saka, M.2    Abé, H.3
  • 5
    • 0032292876 scopus 로고    scopus 로고
    • A new approach to calculate atomic flux divergence by electromigration
    • Sasagawa, K., Nakamura, N., Saka, M. and Abé, H., 1998a," A New Approach to Calculate Atomic Flux Divergence by Electromigration," ASME Journal of Electronic Packaging, Vol.120, No.4, pp. 360-366.
    • (1998) ASME Journal of Electronic Packaging , vol.120 , Issue.4 , pp. 360-366
    • Sasagawa, K.1    Nakamura, N.2    Saka, M.3    Abé, H.4
  • 6
    • 0347065903 scopus 로고    scopus 로고
    • Experimental verification of dominating parameter of electromigration damage in metal lines of electronic packages
    • in Japanese, in press
    • Sasagawa, K., Nakamura, N., Saka, M. and Abé, H., 1998b, "Experimental Verification of Dominating Parameter of Electromigration Damage in Metal Lines of Electronic Packages," Transactions of the Japan Society of Mechanical Engineers, in Japanese, in press.
    • (1998) Transactions of the Japan Society of Mechanical Engineers
    • Sasagawa, K.1    Nakamura, N.2    Saka, M.3    Abé, H.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.