Comparison between TiO2 thin films on InP and GaAs substrates by metalorganic chemical vapor deposition

Journal of the Korean Physical Society

Volumn 32, Issue 4 SUPPL., 1998, Pages

  Han, Young Ki ^a,c   Lee, T G ^a   Yom, S S ^a   Son, M H ^a,d   Kim, E K ^a   Min, S K ^a   Lee, J Y ^b  

^a Korea Institute of Science and Technology   (South Korea)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^c Sungkyunkwan University   (South Korea)

^d Kyonggi University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032374455     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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