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Volumn 9, Issue 3, 2000, Pages 781-785
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Characterization of defects in thin films of hydrogenated amorphous carbon
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
CHEMICAL VAPOR DEPOSITION;
DEFECTS;
ELECTRODES;
ELECTRON SPIN RESONANCE SPECTROSCOPY;
FILM GROWTH;
HYDROGENATION;
INTERFACES (MATERIALS);
NITROGEN;
SILICON;
SUBSTRATES;
THIN FILMS;
HYDROGENATED AMORPHOUS CARBONS;
AMORPHOUS FILMS;
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EID: 0033739007
PISSN: 09259635
EISSN: None
Source Type: Journal
DOI: 10.1016/S0925-9635(99)00325-8 Document Type: Article |
Times cited : (33)
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References (17)
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