Effect of cooling rate on excimer laser crystallization of silicon thin films

NEC Research and Development

Volumn 41, Issue 2, 2000, Pages 202-206

  Tanabe, Hiroshi ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; ANNEALING; CRYSTALLIZATION; LASER BEAM EFFECTS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SUPERCOOLING; THIN FILM TRANSISTORS;

LASER ANNEALING; LASER CRYSTALLIZATION; MICROCRYSTALLIZATION;

LASER APPLICATIONS;

EID: 0033722214     PISSN: 0547051X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (13)

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