Diffusion effects and conductivity of Ge- and Pb-implanted TiO2 single crystals

Surface and Coatings Technology

Volumn 128-129, Issue 1, 2000, Pages 364-369

  Fromknecht, R ^a   Wiss, T ^b   Khubeis, I ^c   Meyer, O ^c  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b JOINT RESEARCH CENTRE   (Italy)

^c AL BALQA APPLIED UNIVERSITY   (Jordan)

Author keywords

Channeling; Electrical conductivity; Ion implantation; Lattice disorder; TiO2 single crystals

Indexed keywords

ANNEALING; CRYSTAL LATTICES; DIFFUSION IN SOLIDS; ELECTRIC CONDUCTIVITY OF SOLIDS; ENERGY DISPERSIVE SPECTROSCOPY; ION IMPLANTATION; PRECIPITATION (CHEMICAL); RUTHERFORD BACKSCATTERING SPECTROSCOPY; SINGLE CRYSTALS; THERMAL EFFECTS;

LATTICE DISORDER;

TITANIUM DIOXIDE;

EID: 0033719420     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00634-4     Document Type: Article

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