In situ measurement of thickness dependence of magnetoresistance and magnetic hysteresis loops of ultrathin Co films on a SiO2/Si(1 1 1) substrate

Journal of Magnetism and Magnetic Materials

Volumn 217, Issue 1, 2000, Pages 199-206

  Wang, G C ^a  

^a Research Rensselaer Polytechnic Institute   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT; COERCIVE FORCE; KERR MAGNETOOPTICAL EFFECT; MAGNETIC DOMAINS; MAGNETIC HYSTERESIS; MAGNETIC VARIABLES MEASUREMENT; MAGNETORESISTANCE; SEMICONDUCTING SILICON; SILICA; SUBSTRATES;

DOMAIN EFFECT; SURFACE MAGNETO OPTICAL KERR EFFECT; THICKNESS DEPENDENCE; ULTRATHIN COBALT FILM;

ULTRATHIN FILMS;

EID: 0033719002     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(00)00341-3     Document Type: Article

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