SCOPUS 정보 검색 플랫폼

Surface Science

Volumn 400, Issue 1-3, 1998, Pages 19-28

Thickness-dependent coercivity of ultrathin Co films on a rough substrate: Cu-buffered Si(111)

(5) Min, H G a Kim, S H a,b Li, M c Wedding, J B c Wang, G C c

a Hong Ik University (South Korea)

b Sungkyunkwan University (South Korea)

c RENSSELAER POLYTECHNIC INSTITUTE (United States)

Author keywords

Atomic force microscopy; Cobalt; Copper; LEED; Magnetic films; MBE; Morphology; Roughness; Silicon; Surface structure

Indexed keywords

COBALT; COERCIVE FORCE; COPPER; EVAPORATION; KERR MAGNETOOPTICAL EFFECT; LOW ENERGY ELECTRON DIFFRACTION; MAGNETIC HYSTERESIS; MOLECULAR BEAM EPITAXY; MORPHOLOGY; SILICON; SURFACE ROUGHNESS; ULTRATHIN FILMS;

MONOLAYER EQUIVALENT (MLE) COVERAGES; THICKNESS DEPENDENT COERCIVITY;

MAGNETIC THIN FILMS;

EID: 0032028179 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(97)00837-6 Document Type: Article

Times cited : (26)

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