Enhanced diamond film growth by Xe-added microwave plasma CVD

Thin Solid Films

Volumn 368, Issue 2, 2000, Pages 269-274

  Hosomi, Takeshi ^a,b   Maki, Tetsuro ^a,b   Kobayashi, Takeshi ^a,b  

^a Osaka University   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; ARGON; CRYSTALLIZATION; DISSOCIATION; ELECTRONIC PROPERTIES; FILM GROWTH; FREE RADICALS; MISFET DEVICES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS; TRANSCONDUCTANCE; XENON;

MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION; MICROWAVE PLASMA IMPEDANCE MEASUREMENT; PLASMA EMISSION SPECTRA; RAMAN SHIFT;

DIAMOND FILMS;

EID: 0033718662     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)00780-X     Document Type: Article

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