Surface roughening in electrodeposited nickel films on ITO glasses at a low current density

Surface Science

Volumn 459, Issue 1, 2000, Pages

  Saitou, M ^a   Makabe, A ^a   Tomoyose, T ^a  

^a UNIVERSITY OF THE RYUKYUS   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CURRENT DENSITY; ELECTROCHEMISTRY; ELECTRODEPOSITION; GROWTH (MATERIALS); INDIUM COMPOUNDS; MOLECULAR ORIENTATION; MORPHOLOGY; NICKEL; REACTION KINETICS; SURFACE ROUGHNESS; X RAY SCATTERING;

INDIUM TIN OXIDE;

GLASS;

EID: 0033706822     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(00)00551-3     Document Type: Article

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