Deposition of a-SiC:H thin film from organosilicon material by remote plasma CVD method

Thin Solid Films

Volumn 368, Issue 2, 2000, Pages 181-184

  Xu, Y Y ^a   Muramatsu, T ^a   Taniyama, M ^a   Aoki, T ^a   Hatanaka, Y ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ARGON; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON CARBIDE;

HEXAMETHYLDISILANE; HYDROGENATED AMORPHOUS SILICON CARBIDE;

THIN FILMS;

EID: 0033688750     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)00761-6     Document Type: Article

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