Group III metal sulfide thin films from single-source precursors by chemical vapor deposition (CVD) techniques

Materials Research Society Symposium - Proceedings

Volumn 606, Issue , 2000, Pages 127-132

  Lazell, Mike R ^a   O'Brien, Paul ^a   Otway, David J ^b   Park, Jin H O ^b  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

^b IMPERIAL COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

BOROSILICATE GLASS; CHEMICAL VAPOR DEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; FILM PREPARATION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING INDIUM COMPOUNDS; SINGLE CRYSTALS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHALCOGENIDE MATERIALS; METAL SULFIDE THIN FILMS;

THIN FILMS;

EID: 0033678120     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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