Thermal phase evolution of Pt-Si intermetallic thin films prepared by the activated adsorption of SiH4 on Pt(100) and comparison to known structural models

Journal of the American Chemical Society

Volumn 121, Issue 11, 1999, Pages 2498-2507

  Bondos, Joseph C ^a   Drummer, Nicole E ^a   Gewirth, Andrew A ^a   Nuzzo, Ralph G ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTAL ATOMIC STRUCTURE; CRYSTAL ORIENTATION; FILM GROWTH; INTERMETALLICS; MORPHOLOGY; PHASE TRANSITIONS; PLATINUM ALLOYS; SILANES; SURFACE STRUCTURE;

FLASH ANNEALING; THERMOLYTIC DECOMPOSITION;

METALLIC FILMS;

PLATINUM; SILICON;

ADSORPTION; ARTICLE; COMPARATIVE STUDY; FILM; SEMICONDUCTOR; STRUCTURE ANALYSIS;

EID: 0033599505     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja9828511     Document Type: Article

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