Highly corrected submicrometer grid patterning on curved surfaces

Applied Optics

Volumn 38, Issue 2, 1999, Pages 339-351

  Baker, Kenneth M ^a  

^a Optimerix Company (818 782 8718)   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; BANDPASS FILTERS; DIFFRACTION GRATINGS; FOCUSING; INTERFEROMETRY; LASERS; LIGHT POLARIZATION; MOIRE FRINGES; OPTICAL COLLIMATORS; REFRACTIVE INDEX; SILICA; ULTRAVIOLET RADIATION;

ARGON FLUORIDE LASER; DIVERGING CLOSE PACKED LATTICE; GRID PATTERNING; HOLOGRAPHIC PROJECTOR SYSTEM; HYPERCOMATIC FOCUSING OBJECTIVE; INTERFEROMETRIC ANGLES; SUBWAVELENGTH STRUCTURED SURFACES;

HOLOGRAPHY;

EID: 0033540152     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.38.000339     Document Type: Article

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