SCOPUS 정보 검색 플랫폼 - 논문 보기

메뉴 건너뛰기

Thin Solid Films

Volumn 339, Issue 1-2, 1999, Pages 270-276

Feature scale simulation of selective chemical vapor deposition process

(2) Yun, Jong Ho a,b Rhee, Shi Woo a

a Pohang University of Science and Technology (POSTECH) (South Korea)

b Hynix Semiconductor Inc (South Korea)

Author keywords

Chemical vapor deposition; Feature scale model

Indexed keywords

ALGORITHMS; ASPECT RATIO; COMPUTER SIMULATION; DEPOSITION; DIFFUSION IN SOLIDS; MATHEMATICAL MODELS; MICROSTRUCTURE; MONTE CARLO METHODS; THIN FILMS;

FEATURE SCALE MODEL; STICKING COEFFICIENT; SURFACE DIFFUSION COEFFICIENT;

CHEMICAL VAPOR DEPOSITION;

EID: 0033534957 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(98)01405-9 Document Type: Article

Times cited : (6)

References (17)

1
- 0028380314
- Y. Maeda, H. Suzuki, T. Sakoh, K. Morita, M. Morita, T. Ohmi, J. Electrochem. Soc. 141 (1994) 566.
- (1994) J. Electrochem. Soc. , vol.141 , pp. 566
- Maeda, Y.¹ Suzuki, H.² Sakoh, T.³ Morita, K.⁴ Morita, M.⁵ Ohmi, T.⁶

2
- 0000637798
- J. Holleman, A. Hasper, C.R. Kleijn, J. Electrochem. Soc. 140 (1993) 818.
- (1993) J. Electrochem. Soc. , vol.140 , pp. 818
- Holleman, J.¹ Hasper, A.² Kleijn, C.R.³

3
- 3843137005
- E.G. Colgan, J.D. Chapple-Sokol, J. Vac. Sci. Technol. B 10 (1992) 1156.
- (1992) J. Vac. Sci. Technol. B , vol.10 , pp. 1156
- Colgan, E.G.¹ Chapple-Sokol, J.D.²

4
- 0031697344
- J.-H. Yun, B.-Y. Kim, S. Rhee, Thin Solid Films 312 (1998) 259.
- (1998) Thin Solid Films , vol.312 , pp. 259
- Yun, J.-H.¹ Kim, B.-Y.² Rhee, S.³

5
- 0031999822
- J.-H. Yun, S. Rhee, J. Mater. Sci. Mater. Electron. 9 (1998) 1.
- (1998) J. Mater. Sci. Mater. Electron. , vol.9 , pp. 1
- Yun, J.-H.¹ Rhee, S.²

6
- 25144505427
- D.-H. Kim, R.H. Wentorf, W.N. Gill, J. Vac. Sci. Technol. A 12 (1994) 153.
- (1994) J. Vac. Sci. Technol. A , vol.12 , pp. 153
- Kim, D.-H.¹ Wentorf, R.H.² Gill, W.N.³

7
- 0001559599
- A. Jain, T.T. Kodas, R. Jairath, M.J. Hampden-Smith, J. Vac. Sci. Technol. B 11 (1993) 2107.
- (1993) J. Vac. Sci. Technol. B , vol.11 , pp. 2107
- Jain, A.¹ Kodas, T.T.² Jairath, R.³ Hampden-Smith, M.J.⁴

8
- 0020893132
- H. Kitajima, A. Ishitani, N. Endo, K. Tanno, Jpn. J. Appl. Phys. 22 (1983) L783.
- (1983) Jpn. J. Appl. Phys. , vol.22
- Kitajima, H.¹ Ishitani, A.² Endo, N.³ Tanno, K.⁴

9
- 0001672114
- J. Murota, N. Nakamura, M. Kato, N. Mikoshiba, T. Ohmi, Appl. Phys. Lett. 54 (1989) 1007.
- (1989) Appl. Phys. Lett. , vol.54 , pp. 1007
- Murota, J.¹ Nakamura, N.² Kato, M.³ Mikoshiba, N.⁴ Ohmi, T.⁵

10
- 0025429815
- C.I. Drowley, M.L. Hammond, Solid State Technol. 33 (1990) 135.
- (1990) Solid State Technol. , vol.33 , pp. 135
- Drowley, C.I.¹ Hammond, M.L.²

11
- 0022806032
- S. Nagao, K. Higashitani, Y. Akasaka, H. Nakata, IEEE Trans. Electron Devices ED-33 (1986) 1738.
- (1986) IEEE Trans. Electron Devices , vol.ED-33 , pp. 1738
- Nagao, S.¹ Higashitani, K.² Akasaka, Y.³ Nakata, H.⁴

12
- 0011320719
- F.W. Tausch Jr., A.G. Lapierre III, J. Electrochem. Soc. 112 (1965) 706.
- (1965) J. Electrochem. Soc. , vol.112 , pp. 706
- Tausch Jr., F.W.¹ Lapierre III, A.G.²

13
- 0022145073
- S
- H. ando Asai, , S, J. Electrochem. Soc. 132 (1985) 2445.
- (1985) J. Electrochem. Soc. , vol.132 , pp. 2445
- Ando Asai, H.¹

14
- 0032084119
- S. Rhee, J.-H. Yun, J. Mater. Sci. Lett. 17 (1998) 947.
- (1998) J. Mater. Sci. Lett. , vol.17 , pp. 947
- Rhee, S.¹ Yun, J.-H.²

15
- 0029326048
- J.-H. Yun, S.-K. Park, Jpn. J. Appl. Phys. 34 (1995) 3216.
- (1995) Jpn. J. Appl. Phys. , vol.34 , pp. 3216
- Yun, J.-H.¹ Park, S.-K.²

16
- 0031553457
- J.-H. Yun, S. Rhee, Thin Solid Films 292 (1997) 324.
- (1997) Thin Solid Films , vol.292 , pp. 324
- Yun, J.-H.¹ Rhee, S.²

17
- 0031143174
- J.-H. Yun, S. Rhee, J. Electrochem. Soc. 144 (1997) 1803.
- (1997) J. Electrochem. Soc. , vol.144 , pp. 1803
- Yun, J.-H.¹ Rhee, S.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.