Effects of the power of electron shower and substrate bias on the synthesis of cementite films

Thin Solid Films

Volumn 345, Issue 1, 1999, Pages 23-28

  Li, S J ^a   Yumoto, H ^a   Shimotomai, M ^b   Ishihara, M ^c  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

^b JFE STEEL CORPORATION   (Japan)

^c NATL INST OF MAT AND CHEM RES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING ENERGY; CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; ELECTRON BEAMS; ELECTRON DIFFRACTION; SYNTHESIS (CHEMICAL); TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CEMENTITE FILM; ELECTRON SHOWER; PHYSICAL VAPOR DEPOSITION;

THIN FILMS;

EID: 0033531832     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00111-X     Document Type: Article

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