Parameters measurement of ECR C4F8/Ar plasma

Thin Solid Films

Volumn 345, Issue 1, 1999, Pages 130-133

  Shindo, M ^a   Hiejima, S ^a   Ueda, Y ^a   Kawakami, S ^b   Ishii, N ^c   Kawai, Y ^a  

^a KYUSHU UNIVERSITY   (Japan)

^b Tokyo Electron Tohoku Co Ltd   (Japan)

^c TOKYO ELECTRON LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CARRIER CONCENTRATION; ELECTRON CYCLOTRON RESONANCE; FLUOROCARBONS; INTERFEROMETERS; MICROWAVES; NEGATIVE IONS; POSITIVE IONS; PROBES;

FLUOROCARBON PLASMA; HEATED LANGMUIR PROBE; MICROWAVE INTERFEROMETERS; NEGATIVE ION DENSITY; PLASMA PARAMETER MEASUREMENT;

PLASMAS;

EID: 0033531810     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00113-3     Document Type: Article

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