Photo-assisted anodic etching of GaN films in NaOH electrolyte with Cl ions

Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 59, Issue 1-3, 1999, Pages 355-357

  Ohkubo, Mitsugu ^a  

^a UNIVERSITY OF FUKUI   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROLYTES; ETCHING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHOTOCHEMICAL REACTIONS; SCANNING ELECTRON MICROSCOPY; SODIUM COMPOUNDS; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

GALLIUM OXIDE; PHOTO ASSISTED ANODIC ETCHING; SODIUM HYDROXIDE;

SEMICONDUCTING GALLIUM COMPOUNDS;

EID: 0033528897     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(98)00382-1     Document Type: Article

References (4)

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2. Pankove J.I. J. Electrochem. Soc. 119:1972;1118.
3. M. Ohkubo, J. Cryst. Growth. 189-190 (1998) 734.
4. Lu H., Wu Z., Bhat I. J. Electrochem. Soc. 144:1997;8.