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Volumn 148, Issue 1-4, 1999, Pages 279-283

Boron diffusion in Si and SiC during 2.5 MeV proton irradiation at 500-850°C

Author keywords

Boron; Diffusion; Irradiation; Point defects; Si; SiC

Indexed keywords

ACTIVATION ENERGY; ANNEALING; COMPOSITION EFFECTS; CRYSTAL ATOMIC STRUCTURE; POINT DEFECTS; PROTON IRRADIATION; RADIATION EFFECTS; SEMICONDUCTING BORON; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SILICON CARBIDE; THERMAL EFFECTS;

EID: 0033513775     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(98)00740-X     Document Type: Article
Times cited : (5)

References (14)
  • 2
    • 0003548581 scopus 로고
    • Les Editions de Physique, Les Ulis, France
    • The fact that atomic diffusion in solids is mediated by point defects is well established. See, for instance, J. Philibert, Atom movements; diffusion and mass transport in solids, Les Editions de Physique, Les Ulis, France, 1991.
    • (1991) Atom Movements; Diffusion and Mass Transport in Solids
    • Philibert, J.1
  • 13
    • 9344253051 scopus 로고    scopus 로고
    • note
    • The irradiation at lower temperatures does not show any measurable enhancement neither.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.