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Volumn 148, Issue 1-4, 1999, Pages 279-283
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Boron diffusion in Si and SiC during 2.5 MeV proton irradiation at 500-850°C
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Author keywords
Boron; Diffusion; Irradiation; Point defects; Si; SiC
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Indexed keywords
ACTIVATION ENERGY;
ANNEALING;
COMPOSITION EFFECTS;
CRYSTAL ATOMIC STRUCTURE;
POINT DEFECTS;
PROTON IRRADIATION;
RADIATION EFFECTS;
SEMICONDUCTING BORON;
SEMICONDUCTING SILICON;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON CARBIDE;
THERMAL EFFECTS;
RADIATION ENHANCED DIFFUSION (RED);
DIFFUSION IN SOLIDS;
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EID: 0033513775
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0168-583X(98)00740-X Document Type: Article |
Times cited : (5)
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References (14)
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