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Volumn 148, Issue 1-4, 1999, Pages 426-431
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Comparison of nucleation and growth of the crystalline and amorphous phase during MeV-ion irradiation of amorphous/crystalline interfaces
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Author keywords
Amorphization; Crystallization; GaAs; InAs; Ion implantation; Ion radiation; Nucleation; Radiation damage; Semiconductors
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Indexed keywords
AMORPHIZATION;
CRYSTAL GROWTH;
CRYSTALLIZATION;
ION BEAMS;
ION BOMBARDMENT;
ION IMPLANTATION;
NUCLEATION;
RADIATION DAMAGE;
SEMICONDUCTING GALLIUM ARSENIDE;
SEMICONDUCTING GERMANIUM;
SEMICONDUCTING INDIUM COMPOUNDS;
SEMICONDUCTING SILICON;
INDIUM ARSENIDE;
ION BEAM CRYSTALLIZATION;
SEMICONDUCTOR MATERIALS;
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EID: 0033513766
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0168-583X(98)00871-4 Document Type: Article |
Times cited : (9)
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References (14)
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