An apparatus for in-situ or sequential plasma immersion ion beam treatment in combination with r.f. sputter deposition or triode d.c. sputter deposition

Surface and Coatings Technology

Volumn 120-121, Issue , 1999, Pages 343-346

  Ensinger, W ^a   Volz, K ^a   Enders, B ^a  

^a PHILIPPS UNIVERSITY MARBURG   (Germany)

Author keywords

Direct current sputter deposition; Plasma immersion ion implantation; Radio frequency sputter deposition; Silicon carbide; Titanium nitride

Indexed keywords

COATING; PLASMA TREATMENT; SPUTTERING; TITANIUM NITRIDE;

EID: 0033502976     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00461-2     Document Type: Conference Paper

References (13)

1. Conrad J.R. J. Appl. Phys. 62:1987;777.
2. Collins G.A., Hutchings R., Tendys J. Mater. Sci. Eng. A. 139:1991;171.
3. Ensinger W. Surf. Coat. Technol. 100-101:1998;341.
4. Mizuno B., Nakayama I., Aoi N., Kubota M., Komeda T. Appl. Phys. Lett. 53:1988;2059.
5. Cheung N.W. Nucl. Instrum. Meth. Phys. Res. B. 55:1991;811.
6. Chu P.K., Qin S., Chan C., Cheung N.W., Larson L.A. Mater. Sci. Eng. R. 17:1996;207.
7. Ensinger W. Mater. Sci. Eng. A. 253:1998;258.
8. Conrad J.R., Dodd R.A., Worzala F.J., Qiu X. Surf. Coat. Technol. 36:1988;927.
9. Matossian J.N. J. Vac. Sci. Technol. B. 12:1994;850.
10. Volz K., Ensinger W., Stritzker B., Rauschenbach B. Surf. Coat. Technol. 103-104:1998;257.
11. Qiu X., Conrad J.R., Dodd R.A., Worzala J.J. Met. Trans. 214:1990;1663.
12. Alonso F., Rinner M., Loinaz A., Onate J.I., Ensinger W., Rauschenbach B. Surf. Coat. Technol. 93:1997;305.
13. Volz K., Ensinger W., Rauschenbach B., Stritzker B. Nucl. Instrum. Meth. Phys. Res. B. 14:1998;663.