Room-temperature growth of ZrO2 thin films using a novel hyperthermal oxygen-atom source

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 1, 1999, Pages 14-18

  Wisotzki, Elmar ^a   Balogh, Adam G ^a   Hahn, Horst ^a   Wolan, John T ^b   Hoflund, Gar B ^b  

^a DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^b University of Florida   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033480225     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581547     Document Type: Article

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