Laser-induced particle formation and coalescence in a methane discharge

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 6, 1999, Pages 3385-3392

  Stoffels, W W ^a,b   Stoffels, E ^a,b   Ceccone, G ^a   Rossi, F ^a  

^a JOINT RESEARCH CENTRE   (Italy)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033421049     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582070     Document Type: Article

References (20)

1. Proc. Dusty Plasmas '95 Workshop on Generation, Transport and Removal of Particles in Plasmas, Wickenburg, Arizona, 1995 [J. Vac. Sci. Technol. A 14(2), 489-665 (1996)].
2. Proc. Dusty Plasmas '95 Workshop on Generation, Transport and Removal of Particles in Plasmas, Wickenburg, Arizona, 1995 [J. Vac. Sci. Technol. A 14(2), 489-665 (1996)].
3. X. Armand, N. Herlin, I. Voicu, and M. Cauchetier, J. Phys. Chem. Solids 58, 1853 (1997).
4. D. B. Geogehan, Appl. Phys. Lett. 62, 1463 (1993).
5. R. Vassen, P. Buchner, J. Uhlenbusch, and D. Stover, Mater. Sci. Forum 269, 213 (1998).
6. Dusty Plasmas: Physics, Chemistry, and Technological Impact in Plasma Processing, edited by A. Bouchoule (Wiley, New York, 1999).
7. P. Roca i Cabarrocas, P. Gay, and A. Hadjadj, J. Vac. Sci. Technol. A 14, 655 (1996).
8. Proceedings International Workshop on Dusty Plasmas, Noordwijkerhout, The Netherlands, January 1998.
9. D. A. Mendis, C. W. Chow, and P. K. Shukla, Proceedings 6th Workshop The Physics of Dusty Plasmas, La Jolla, California, 1995 (World Scientific, Singapore, 1996), ISBN 981-02-2644-6.
10. S. Barabash and R. Lundin, IEEE Trans. Plasma Sci. 22, 173 (1994).
11. Y. Hayashi and K. Tachibana, Jpn. J. Appl. Phys., Part 2 33, 804 (1994).
12. E. Stoffels, W. W. Stoffels, G. M. W. Kroesen, and F. J. de Hoog, J. Vac. Sci. Technol. A 14, 556 (1996).
13. S. J. Choi and M. J. Kushner, J. Appl. Phys. 74, 853 (1993).
14. L. Boufendi, J. Hermann, A. Bouchoule, B. Dubreuil, E. Stoffels, W. W. Stoffels, and M. L. de Giorgi, J. Appl. Phys. 76, 148 (1994).
15. C. Cui and J. Goree, IEEE Trans. Plasma Sci. 22, 151 (1994).
16. E. Stoffels, W. W. Stoffels, G. M. W. Kroesen, and F. J. de Hoog, Electron Technol. 31, 255 (1998).
17. W. W. Stoffels, E. Stoffels, G. M. W. Kroesen, and F. J. de Hoog, J. Vac. Sci. Technol. A 14, 588 (1996).
18. A. Melzer, A. Homann, and A. Piel, Phys. Rev. E 53, 2757 (1996).
19. P. K. Bachmann and D. U. Wiechert, Diamond Relat. Mater. 1, 422 (1992).
20. T. Matsoukas and M. Russel, J. Appl. Phys. 77, 4285 (1991).