Microprobe as implanter for semiconductor devices

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 158, Issue 1, 1999, Pages 39-43

  Meijer, J ^a   Stephan, A ^a   Adamczewski, J ^a   Rocken H ^a   Weidenmuller U ^a   Bukow, H H ^a   Rolfs, C ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS; ION IMPLANTATION; MAGNETIC LENSES; PROBES; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DOPING; SOLENOIDS; SUPERCONDUCTING MAGNETS; TITANIUM;

ION MICROPROBES; ION PROJECTION; MASKLESS IMPLANTATION;

ION MICROSCOPES;

EID: 0033356851     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00334-1     Document Type: Article

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