Large-area pulsed laser deposition of tantalum oxide films

Materials Research Society Symposium - Proceedings

Volumn 567, Issue , 1999, Pages 527-534

  Boughaba, S ^a   Islam, M U ^a   Sproule, G I ^b   Graham, M J ^c  

^a NATIONAL RESEARCH COUNCIL CANADA   (Canada)

^b Integrated Manufacturing Technologies Institute   (United States)

^c Institute for Microstructural Sciences   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; DEPOSITION; EXCIMER LASERS; FILM GROWTH; LASER ABLATION; OPTICAL PROPERTIES; OXYGEN; PULSED LASER APPLICATIONS; REFRACTIVE INDEX; SILICON WAFERS; TANTALUM COMPOUNDS; THICKNESS MEASUREMENT;

PULSED LASER DEPOSITION; TANTALUM OXIDE FILMS;

DIELECTRIC FILMS;

EID: 0033355974     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-567-527     Document Type: Conference Paper

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