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Volumn 572, Issue , 1999, Pages 51-55
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Effect of varying oxidation parameters on the generation of C-dangling bond centers in oxidized SiC
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Author keywords
[No Author keywords available]
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Indexed keywords
ENERGY GAP;
HEAT TREATMENT;
HYDROGEN BONDS;
MOSFET DEVICES;
OXIDATION;
PARAMAGNETIC RESONANCE;
TEMPERATURE;
CARBON DANGLING BONDS;
DRY HEAT TREATMENT;
WIDE BAND GAP SEMICONDUCTORS;
SEMICONDUCTING SILICON COMPOUNDS;
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EID: 0033350420
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-572-51 Document Type: Conference Paper |
Times cited : (2)
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References (13)
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