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Volumn 572, Issue , 1999, Pages 51-55

Effect of varying oxidation parameters on the generation of C-dangling bond centers in oxidized SiC

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY GAP; HEAT TREATMENT; HYDROGEN BONDS; MOSFET DEVICES; OXIDATION; PARAMAGNETIC RESONANCE; TEMPERATURE;

EID: 0033350420     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-572-51     Document Type: Conference Paper
Times cited : (2)

References (13)
  • 2
    • 0031639268 scopus 로고    scopus 로고
    • Hydrogen in Semiconductors and Metals, edited by N.H. Nickel, W.B. Jackson, R.C. Bowman, and R. Leisure Pittsburgh, PA
    • P.J. Macfarlane and M.E. Zvanut, in Hydrogen in Semiconductors and Metals, edited by N.H. Nickel, W.B. Jackson, R.C. Bowman, and R. Leisure (Mater. Res. Soc. 513, Pittsburgh, PA 1998), pp. 433-438.
    • (1998) Mater. Res. Soc. , vol.513 , pp. 433-438
    • Macfarlane, P.J.1    Zvanut, M.E.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.