Ion-beam analysis of phospholipid thin films deposited on c-Si

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 159, Issue 1, 1999, Pages 67-74

  Som, T ^a,b   Khan, T K ^a,c   Gupta Bhaya, P ^a   Kumar, S ^a   Kulkarni, V N ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

^b INTER UNIVERSITY ACCELERATOR CENTRE   (India)

^c TEMPLE UNIVERSITY SCHOOL OF MEDICINE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; COATING TECHNIQUES; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HELIUM; HYDROGEN; ION BEAMS; ION BOMBARDMENT; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON WAFERS; THIN FILMS;

DEPTH PROFILING; ELASTIC RECOIL DETECTION ANALYSIS (ERDA); ION CHANNELING; PHOSPHOLIPID; SPIN COATING;

LIPIDS;

EID: 0033349573     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00521-2     Document Type: Article

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