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Materials Research Society Symposium - Proceedings

Volumn 569, Issue , 1999, Pages 113-118

In-situ optical characterization of titanium nitride thin films for applications in microelectronics

(3) Patsalas, P a Logothetidis, S a Dimitriadis, C A a

a ARISTOTLE UNIVERSITY OF THESSALONIKI (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; ELECTRIC CONDUCTIVITY; ELECTRIC POTENTIAL; ELECTRON ENERGY LEVELS; ELLIPSOMETRY; MAGNETRON SPUTTERING; MATHEMATICAL MODELS; OPTICAL PROPERTIES; PLASMAS; SEMICONDUCTING SILICON; TEMPERATURE; TITANIUM NITRIDE;

DRUDE TERM; LORENTZ OSCILLATOR TERMS; NEGATIVE BIAS VOLTAGE; PLASMA ENERGY; REACTIVE MAGNETRON SPUTTERING; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 0033348769 PISSN: 02729172 EISSN: None Source Type: Conference Proceeding
DOI: 10.1557/proc-569-113 Document Type: Conference Paper

Times cited : (4)

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