Laser surface cleaning of organic contaminants

Applied Surface Science

Volumn 150, Issue 1, 1999, Pages 131-136

  Feng, Y ^a,b   Liu, Z ^b,c   Vilar, R ^a   Yi, X S ^b  

^a INSTITUTO SUPERIOR TÉCNICO   (Portugal)

^b ZHEJIANG UNIVERSITY   (China)

^c UNIVERSITY OF MINHO   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; DENSITY (OPTICAL); EXCIMER LASERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LASER PULSES; MATHEMATICAL MODELS; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SUBSTRATES; SURFACE CLEANING;

BEER LAMBERT LAW; KRYPTON FLUORIDE EXCIMER LASER; LASER SURFACE CLEANING; ORGANIC CONTAMINANTS; PROFILOMETER;

IMPURITIES;

EID: 0033345025     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00237-8     Document Type: Article

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