High-Resolution Soft X-Ray Emission Spectra of Crystalline Carbon Nitride Films Deposited by Electron Cyclotron Resonance Sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 9 A, 1999, Pages 5143-5147

  Muramatsu, Yasuji ^a   Tani, Youji ^b   Aoi, Yoshifumi ^c   Kamuo, Eiji ^d   Kaneyoshi, Takahiro ^e   Motoyama, Muneyuki ^f   Delaunay, Jean J ^a   Hayashi, Takayoshi ^b   Grush, Melissa M ^c   Callcott, Thomas A ^d   Ederer, David L ^e   Heske, Clemens ^f   Underwood, James H ^a   Perera, Rupert C C ^b  

^a NTT CORPORATION   (Japan)

^b Ryitkokii University   (Japan)

^c Hyogo Prefectural Institute of Industrial Research Technical Center for Machinery and Metals   (Japan)

^d University of Tennessee   (United States)

^e TULANE UNIVERSITY   (United States)

^f LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

Carbon nitride; Electronic structure; Molecular orbital calculation; Synchrotron radiation; X ray emission spectra

Indexed keywords

BAND STRUCTURE; CARBON INORGANIC COMPOUNDS; CHEMICAL BONDS; CRYSTALLINE MATERIALS; ELECTRONIC DENSITY OF STATES; ELECTRONIC STRUCTURE; EMISSION SPECTROSCOPY; NITRIDES; SPUTTER DEPOSITION; X RAY SPECTROSCOPY;

CARBON NITRIDES;

PROTECTIVE COATINGS;

EID: 0033329098     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.5143     Document Type: Article

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