Porous freestanding diamond membranes with reduced pore diameter

Thin Solid Films

Volumn 353, Issue 1, 1999, Pages 239-243

  Mammana, V P ^a   Silva, S ^a   Mansano, R D ^a   Verdonck, P ^a   Pavani Filho, A ^b   Salvadori, M C ^a   Brown, I G ^c  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

^b Ctro Tecn para Info SP   (Brazil)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING; PORE SIZE; POROUS SILICON; SILICON WAFERS; X RAY LITHOGRAPHY;

PORE SHUTTING RATE; POROUS DIAMOND MEMBRANES;

DIAMOND FILMS;

EID: 0033319479     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00296-5     Document Type: Article

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