Competitive adsorption of cations onto the silicon surface the role of the ammonium ion in ammonia-peroxide solution

Journal of the Electrochemical Society

Volumn 146, Issue 10, 1999, Pages 3886-3889

  Loewenstein, Lee M ^a,b   Mertens, Paul W ^a  

^a IMEC   (Belgium)

^b TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; AMMONIA; AMMONIUM COMPOUNDS; HYDROGEN PEROXIDE; ION EXCHANGE; MATHEMATICAL MODELS; POSITIVE IONS; SOLUTIONS; WATER;

AMMONIA-HYDROGEN PEROXIDE-WATER SOLUTION;

SEMICONDUCTING SILICON;

EID: 0033312303     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1392567     Document Type: Article

References (27)

1. W. Kern and D. Puotinen, RCA Rev., 31, 187 (1970).
2. D.C. Burkman, D. Deal, D. C. Grant, and C. A. Perterson, in Handbook of Semiconductor Wafer Cleaning Teclinology: Science, Technology and Applications, W. Kern, Editor, pp. 120-128, Noyes Publications, Park Ridge, NJ (1993).
3. W. Kern, in Handbook of Semiconductor Wafer Cleaning Technology: Science, Technology and Applications, W. Kem, Editor, pp. 44-52, Noyes Publications, Park Ridge, NJ (1993).
4. L. Mouche, F. Tardif, and J. Derrien, J. Electrochem. Soc., 142, 2395 (1995).
5. Y. Mori, K. Uemura, K. Shimanoe, and T. Sakon, J. Electrochem. Soc., 142, 3104 (1995).
6. P.W. Mertens, L. M. Loewenstein, R. Vos, S. De Gendt, T. Bearda, and M. M. Heyns, in Silicon Materials Science and Technology, H. R. Huff, H. Tsuya, and U. Gosele, Editors, PV 98-1, p. 592, The Electrochemical Society Proceedings Series, Pennington, NJ(1998).
7. L. Hall, J. Sees, T. Kurd, B. Schmidt, and L. Bellay, in 1998 Proceedings of Contamination Control, ICCCS 14th International Symposium on Contamination Control, p. 1, Institute of Environmental Sciences and Technology, Mount Prospect, IL (1998).
8. Outokumpu HSC Chemistry® for Windows, version 3.0 (1997), Outokumpu
9. Research Oy, FIN-28101 Pori, Finland; E-mail: hsc@outokumpu.fi.
10. M. Takiyama, S. Ohtsuka, S. Hayashi, and M. Tachimori, in Semiconductor Silicon/1994, H. R. Huff, W. Bergholz, and K. Sumino, Editors, PV 94-10, p. 346, The Electrochemical Society Proceedings Series, Pennington, New Jersey (1994).
11. T. Bearda, S. De Gendt, L. Loewenstein, M. Knotter, P. Mertens, and M. Heyns, in Proceedings of the Symposium on Ultra Clean Processing of Silicon Surfaces 1998, M. Heyns, M. Meuris, and P. Mertens, Editors, p. II, Scitec Publications, Zurich, Switzerland (1999).
12. L.M. Loewenstein, F. Charpin, and P. W. Mertens, J. Electrochem. Soc., 146,719 (1999).
13. L.M. Loewenstein and P. W. Mertens, in Proceedings of the Symposium on Ultra Clean Processing of Silicon Surfaces 199S, M. Heyns, M. Meuris, and P. Mertens, Editors, p. 1, Scitec Publications, Zurich, Switzerland (1999).
14. M. Grundner and H. Jacob, Appl. Phys. A, 39, 73 (1986).
15. T.Q. Kurd, H. F. Schmidt, A. L. P. Rotondaro, P. W. Mertens, L. H. Hall, and M. M. Heyns, in Proceedings of the 4th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, R. E. Novak and J. Ruzyllo, Editors, PV 95-20, p. 277, The Electrochemical Society Proceedings Series, Pennington, NJ (1996).
16. R.K. Her, The Chemistry of Silica: Solubility, Polymerization, Colloid and Surface Properties, and Biochemistry, pp. 180-189; 663-676, Wiley, New York (1979).
17. R.O. James and T. W. Healy, J. Colloid Interface Sei., 40, 65 (1972).
18. K.B. Agashe and J. R. Regalbuto, J. Colloid Interface Sei. 185, 174 (1997).
19. L.M. Loewenstein and P. W. Mertens, J. Electrochem. Soc., 145,2841 (1998).
20. See, for example, W. J. Moore, Physical Chemistry, 4th ed., p. 497, Prentice Hall, Englewood Cliffs, NJ (1972).
21. M. Hourai, T. Naridomi, Y. Oka, K. Murakami, S. Sumita, N. Fujino, and T. Shiraiwa, Jpn. J. Appl. Phys., 27, L2361 (1988).
22. M. Meuris, P. W. Mertens, A. Opdebeeck, H. F. Schmidt, M. Depas, G. Vereecke, M. M. Heyns, and A. Philipossian, Solid Stale Technol., 109 (July 1995).
23. M.M. Heyns, S. Verhaverbeke, M. Meuris, P. W. Mertens, H. Schmidt, M. Kubo-. ta, A. Philipossian, K. Dillenbeck, D. Graf, A. Schnegg, and R. de Blanck, in Mater. Res. Soc. Symp. Proc., Vol. 315, p. 35, MRS, Pittsburgh, PA (1993).
24. S. Verhaverbeke, M. Meuris, P. Mertens, H. Schmidt, M. M. Heyns, A. Philipossian, D. Graf, and K. Dillenbeck, in Proceedings of the 4th International Symposium on Ultra Large Scale Integration Science and Technology, G. K. Celler, E. Middlesworth, and K. Höh, Editors, PV 93-13, p. 199, The Electrochemical Society Proceedings Series, Pennington, NJ (1993).
25. ECHIP Version 6.1.4 for Windows, ECHIP Incorporated, Hockessin, DE.
26. L.M. Loewenstein and P. W. Mertens, Unpublished results.
27. D.C. Burkman, D. Deal, D. C. Grant, and C. A. Perterson, in Handbook of Semiconductor Wafer Cleaning Technology and Applications, W. Kem, Editor, pp. 115116, Noyes Publications, Park Ridge, NJ (1993).