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Volumn 39, Issue 2, 1986, Pages 73-82
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Investigations on hydrophilic and hydrophobic silicon (100) wafer surfaces by X-ray photoelectron and high-resolution electron energy loss-spectroscopy
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Author keywords
68.20; 73; 82.65
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Indexed keywords
CHEMICAL REACTIONS - OXIDATION;
SPECTROSCOPY, ELECTRON - APPLICATIONS;
HIGH-RESOLUTION ELECTRON ENERGY LOSS-SPECTROSCOPY;
HYDROPHILIC SILICON;
HYDROPHOBIC SILICON;
X-RAY PHOTOELECTRON SPECTROSCOPY;
SEMICONDUCTING SILICON;
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EID: 0022662543
PISSN: 07217250
EISSN: 14320630
Source Type: Journal
DOI: 10.1007/BF00616822 Document Type: Article |
Times cited : (424)
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References (35)
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