SiO vapor pressure in an SiO2 glass/Si melt/SiO gas equilibrium system

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 38, Issue 10 B, 1999, Pages

  Huang, Xinming ^a   Terashima, Kazutaka ^b   Hoshikawa, Keigo ^a  

^a SHINSHU UNIVERSITY   (Japan)

^b SHONAN INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH FROM MELT; GLASS; MOLTEN MATERIALS; PHASE EQUILIBRIA; PRESSURE MEASUREMENT; SILICA; THERMAL EFFECTS; VAPOR PRESSURE;

SILICA AMPOULE;

SEMICONDUCTING SILICON;

EID: 0033309550     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.l1153     Document Type: Article

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