Preparation and characterization of MgO thin films by a novel sol-gel method

Journal of Sol-Gel Science and Technology

Volumn 16, Issue 3, 1999, Pages 277-281

  Fu, Xiaorong ^a   Song, Zhitang ^a   Wu, Guangming ^b   Huang, Jipo ^a   Duo, Xinzhong ^a   Lin, Chenglu ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b BEIJING INSTITUTE OF PETROCHEMICAL TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CRYSTAL MICROSTRUCTURE; CRYSTALLIZATION; FILM PREPARATION; MAGNESIA; PROTECTIVE COATINGS; SILICON; SOL-GELS; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

COLLODION;

METALLIC FILMS;

EID: 0033308743     PISSN: 09280707     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1008725521769     Document Type: Article

References (24)

1. H.Z. Durusoy, J. Mat. Sci. Lett. 10, 1023 (1991).
2. W.Y. Hsu and R. Raj, Appl. Phys. Lett. 60, 3105 (1992).
3. T. Mihara, S. Mochizuki, and R. Makabe, Jpn. J. Appl. Phys. 35, 4905 (1996).
4. S.S. Kim, Y.M. Kang, and S. Baik, J. Am. Ceram. Soc. 79, 1105 (1996).
5. M. Vellaikal and A.I. Kingon, Thin Solid Films 287, 139 (1996).
6. F. Goerke, A. Thorns, and U. Merkt, Appl. Surf. Sci. 96, 708 (1996).
7. R. Huang and A.H. Kitai, Appl. Phys. Lett. 61, 1450 (1992).
8. L. Swartz and V.E. Wood, Condens. Matter. News. 1, 4 (1992).
9. G. Yi and M. Sayer, Am. Ceram. Soc. Bull. 70, 1173 (1991).
10. D.K. Fork, F.A. Ponce, J.C. Tramontana, and T.H. Geballe, Appl. Phys. Lett. 58, 2294 (1991).
11. W.J. DeSisto and R.L. HenryL, J. Cryst. Growth. 109, 314 (1991).
12. S. Kim and S. Hishita, Thin Solid Films 282, 449 (1996).
13. J. Senzaki, O. Mitsunaga, T. Uchida, T. Ueno, and K. Kuroiwa, Jpn. J. Appl. Phys. 35, 4195 (1996).
14. J.G. Yoon and K. Kim, Appl. Phys. Lett. 68, 2523 (1996).
15. N. Neumann and R. Bruchhaus, Integrated Ferroelectrics 8, 243 (1995).
16. E.J. Tarsa, M.De. Graef, D.R. Clarke, A.C. Gossard, and J.S. Speck, J. Appl. Phys. 73, 3276 (1993).
17. L.S. Huang, L.R. Zheng, and T.N. Blanton, Appl. Phys. Lett. 60, 3129 (1992).
18. A. Masuda and K. Nashimoto, Jpn. J. Appl. Phys. 33, L793 (1994).
19. B.S. Kwak, E.P. Boyd, K. Zhang, A. Erbil, and B. Wilkins, Appl. Phys. Lett. 54, 2542 (1995).
20. J.H. Boo, K.S. Yu, W. Koh, and Y. Kim, Mater. Lett. 26, 233 (1996).
21. J.G. Yoon and K. Kim, Appl. Phys. Lett. 66, 2661 (1995).
22. A.A. Rywak, J.M. Burlitch, and T.M. Loehr, Chem. Mater. 7, 2028 (1995).
23. In-Chyuan Ho, Yuhuan Xu, and J.D. Mackenzie, J. Sol-Gel. Sci. Technol. 9, 295 (1997).
24. Y. Kaneko, N. Mikoshiba, and T. Yamashita, Jpn. J. Appl. Phys. 30, 1091 (1991).