Ashing of organic compounds with spray-type plasma reactor at atmospheric pressure

Plasmas and Polymers

Volumn 4, Issue 4, 1999, Pages 269-281

  Tanaka, Kunihito ^a   Inomata, Tadaaki ^a   Kogoma, Masuhiro ^a  

^a SOPHIA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHEMICAL REACTORS; HELIUM; MIXTURES; OXYGEN; PLASMAS; PRESSURE EFFECTS;

ASHING; ATMOSPHERIC PRESSURE GLOW PLASMA; SPRAY TYPE REACTOR;

ORGANIC COMPOUNDS;

EID: 0033292534     PISSN: 10840184     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1021879411056     Document Type: Article

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