Large area GaN substrates

Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 66, Issue 1, 1999, Pages 26-29

  Kryliouk, Olga ^a   Reed, Mike ^a   Dann, Todd ^a   Anderson, Tim ^a   Chai, Bruce ^b  

^a University of Florida   (United States)

^b Crystal Photonics Inc Sanford   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COOLING; CRYSTAL LATTICES; LITHIUM COMPOUNDS; METALLORGANIC VAPOR PHASE EPITAXY; MORPHOLOGY; NITRIDES; NITRIDING; SEMICONDUCTING FILMS; SEMICONDUCTOR GROWTH; SUBSTRATES; SURFACE STRUCTURE;

GALLIUM NITRIDE;

SEMICONDUCTING GALLIUM COMPOUNDS;

EID: 0033284411     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(99)00114-2     Document Type: Article

References (15)

1. Nakamura S. Compound Semiconductor. 3:1997;15.
2. S. Nakamura, Int. Symp. Compound Semiconductors, Sept. 8-10, 1997.
3. Nakamura S., Senoh M., Nagahama S., Iwasa N. et al. Appl. Phys. Lett. 72(16):1998;2014.
4. Amano H., Sawaki N., Akazaki I., Toyoda Y. Appl. Phys. Lett. 48:1986;356.
5. Y.V. Melnik, K.V. Vaassilevski, I.P. Nikitina, A.I. Babanin, V.Y. Davydov, V.A. Dmitriev, MIJ-NSR, Vol. 2, Art. 39.
6. Kryliouk O., Dann T., Anderson T., Maruska P., Zhu L.D., Daly J., Lin M.-E., Norris P., Chai B., Kisker D. Mater. Res. Soc. Proc. 493:1998;113.
7. O. Kryliouk, T. Dann, T. Anderson, A. Gaskov, K. Jones, J.H. Li, B. Chai, in: 8th Biennial Workshop on Organometallic Vapor Phase Epitaxy, Dana Point, CA, 1997, p. 14.
8. O. Kryliouk, T. Dann, T. Anderson, A. Gaskov, K. Jones, J.H. Li, B. Chai, in: MRS Spring Meeting, San Francisco, CA, 1997, p. 86.
9. Ponce F.A., Bour D.P., Gotz W., Johnson N.M., Helava H.I., Grzegory I., Jun J., Porowski S. Appl. Phys. Lett. 68(7):1996;917.
10. Gassmann A., Suski T., Newman N., Kosielowski C., Jones E., Weber E.R., Liliental-Weber Z., Rubin M.D., Helava H.I., Grzegory I., Bockowski M., Jun J., Porowski S. Appl. Phys. 80(4):1996;2195.
11. Grzegory I., Jun J., Krukowski S., Bockowski M., Porowski S. Physica B. 185:1993;99.
12. Wong W.S., Sands T., Cheung N.W. Appl. Phys. Lett. 72(5):1998;599.
13. Kung P., Saxler A., Zhang X., Walker D., Lavado R., Razeghi M. Appl. Phys. Lett. 69:1996;14.
14. O. Kryliouk, T. Dann, T. Anderson, A. Gaskov, K. Jones, J.H. Li, B. Chai, E. Lamberg, in: CVD-XIV EVROCVD II, Paris, 1997, p. 2104.
15. O. Kryliouk, M. Reed, T. Dann, T. Anderson, in: MRS Spring Meeting, San Francisco, CA, 1998, p. 107.