Surface diagnostics of dry etched III-V semiconductor samples using focused ion beam and secondary ion mass spectrometry

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3080-3084

  Yu, Siyuan ^a   Heard, Peter ^a   Cakmak, Bulent ^a   Penty, R V ^a   White, I H ^a  

^a UNIVERSITY OF BRISTOL   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033271719     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590958     Document Type: Article

References (7)

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6. Plasma Etching, edited by D. M. Manos and D. L. Flamm (Academic, New York, 1989), Chap. 2.
7. S. Yu, M. Owen, R. Varrazza, R. V. Penty, I. H. White, D. Rogers, S. Perrin, and C. C. Button, CLEO'99 post deadline paper CPD24, Baltimore, 23-28 May 1999.