Relationship between the slope of the HD curve and the fundamental resist process contrast

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3362-3366

  Brunner, Timothy A ^a  

^a IBM RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033269535     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591138     Document Type: Article

References (10)

1. C. A. Mack, S. Jug, and D. A. Legband, Proc. SPIE 3677, 415 (1999).
2. T. A. Brunner and R. A. Ferguson, Proc. SPIE 2726, 198 (1996).
3. C. A. Mack, Proc. SPIE 2197, 501 (1994).
4. R. Ferguson, R. Martino, and T. Brunner, J. Vac. Sci. Technol. B 15, 2387 (1997).
5. FINLE Technologies, Austin, TX.
6. F. H. Dill, W. P. Hornberger, P. S. Hauge, and J. M. Shaw, IEEE Trans. Electron Devices ED-22, 445 (1975).
7. T. A. Brunner, Proc. SPIE 1466, 297 (1991).
8. S. G. Hansen and R. H. Wang, J. Electrochem. Soc. 140, 166 (1993).
9. C. Mack, Microlithog. World 8, 22 (1999), Eq. (5).
10. S. Babu and V. Srinivasan, IEEE Trans. Electron Devices ED-32, 1896 (1985).