Improving stress stability of Ta film for x-ray mask absorbers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3096, Issue , 1997, Pages 245-250

  Oda, Masatoshi ^a   Sakatani, Miho ^a   Uchiyama, Shingo ^a   Matsuda, Tadahito ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ETCHING; GRAIN BOUNDARIES; METALLIC FILMS; STRESSES; TANTALUM; X RAY LITHOGRAPHY;

X RAY MASK ABSORBERS;

MASKS;

EID: 0031347263     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.277258     Document Type: Conference Paper

References (5)