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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2644-2647

Selective plasma etching for contact holes using a fluorine-based chemistry with addition of N2

(3) Meijer, Peter M a,c Roelofs, Michel E F a,d Manders, Bart S b

a PHILIPS RESEARCH LABORATORIES (Netherlands)

b NXP SEMICONDUCTORS (Netherlands)

c LAM Research BV (Netherlands)

d IBM (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033267344 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (4)

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