Surface processes occurring on TiSi2 and CoSi2 in fluorine-based plasmas: Afterglow of a NF3 plasma

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 1, 1998, Pages 164-172

  Baklanov, M R ^a,b   Vanhaelemeersch, S ^a   Storm, W ^a   Vandervorst, W ^a   Maex, K ^a  

^a IMEC   (Belgium)

^b INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0039626077     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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