A study on the suppression of etch residues by O 2 gas addition in dry etching of Pt film

Journal of the Korean Physical Society

Volumn 35, Issue SUPPL. 4, 1999, Pages

  Kim, Nam Hoon ^a   Kim, Chang Il ^a   Chang, Eui Goo ^a   Kwon, Kwang Ho ^b  

^a Chung Ang University   (South Korea)

^b Hanseo University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033262915     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)

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