Revisiting phase shifting masks in x-ray lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2255-2258

  Khan, Mumit ^a   Bollepalli, Srinivas ^a   Cerrina, Franco ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0039770107     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589624     Document Type: Article

References (9)

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5. B. L. Henke, P. Lee, T. J. Tanaka, R. Shimabukuro, and B. K. Fujikawa, At. Data Nucl. Data Tables 27, 1 (1982).
6. B. L. Henke, AIP Conf. Proc. 75, 146 (1981).
7. E. A. Linfoot, Fourier Analysis of Image Quality (Oxford University Press, Oxford, 1970).
8. S. Bollepalli, "The Study of Aerial Image Quality in X-ray Lithography," CXrL Technical Report, 1997.
9. S. D. Hector and K. Cummings (private communication).