Nanoscale elemental imaging of semiconductor materials using focused ion beam secondary ion mass spectrometry

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2476-2482

  Stevie, F A ^a   Downey, S W ^a   Brown, S R ^a   Shofner, T L ^a   Decker, M A ^a   Dingle, T ^b   Christman, L ^c  

^a NOKIA RESEARCH CENTER   (United States)

^b Fei europe   (United Kingdom)

^c Thermo Fisher Scientific   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033261087     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591115     Document Type: Article

References (24)

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