Resist characteristics with direct write electron beam and SCALPEL exposure system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue I, 1999, Pages 227-236

  Sato, Mitsuru ^a   Ohmori, Katsumi ^a   Ishikawa, Kiyoshi ^a   Nakayama, Toshimasa ^a   Novembre, Anthony E ^a   Ocola, Leonidas E ^a  

^a OHKA America   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ELECTRON BEAMS; IMAGE QUALITY; SENSITIVITY ANALYSIS;

DIRECT WRITE ELECTRON BEAMS; HIGH ACCELERATION VOLTAGE ELECTRON BEAM EXPOSURES;

PHOTORESISTS;

EID: 0032647632     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351094     Document Type: Conference Paper

References (12)