Effect of halogen on the structure of low temperature polycrystalline silicon thin films fabricated on glass substrates

Journal of the Ceramic Society of Japan

Volumn 107, Issue 11, 1999, Pages 1099-1104

  Kamiya, Toshio ^a   Maeda, Yoshiteru ^a   Nakahata, Kouichi ^a   Komaru, Takashi ^a   Fortmann, Charles M ^a   Shimizu, Isamu ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Gas mixing ratio; Microstructure; Orientation structure; Polycrystalline silicon

Indexed keywords

CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; FILM GROWTH; GLASS; HALOGEN COMPOUNDS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SILICON; SUBSTRATES; THIN FILMS;

GAS MIXING RATIO; POLYCRYSTALLINE SILICON THIN FILMS;

CERAMIC MATERIALS;

EID: 0033226136     PISSN: 09145400     EISSN: None     Source Type: Journal    
DOI: 10.2109/jcersj.107.1099     Document Type: Article

References (16)

1. D. Knipp, H. Stiebig, J. Folsch and H. Wagner, J. Non-Cryst. Solids, 227-230, 1321-25 (1998).
2. J. Meier, P. Torres, R. Platz, S. Dubail, U. Kroll, J. A. A. Selvan, N.P. Vaucher, C. Hof, D. Fischer, H. Keppner, A. Shah, K.-D. Ufert, P. Giannoules and J. Koehler, Mater. Res. Soc. Symp. Proc., 420, 3-14 (1996).
3. J. Meier, S. Dubail, J. Cuperus, U. Kroll, R. Platz, P. Torres, J. A. Anna Selvan, P. Pernet, N. Beck, N. P. Vaucher, Ch. Hof, D. Fischer, H. Keppner and A. Shah, J. Non-Cryst. Solids, 227-230, 1250-56 (1998).
4. S. Furukawa and T. Asano Eds., "Chobisai Kako Nyumon," Ohm-sha (1989) pp. 150-54.
5. S. Furukawa and T. Asano Eds., "Chobisai Kako Nyumon," Ohm-sha (1989) pp. 95-96 [in Japanese].
6. A. Matsuda, J. Non-Cryst. Solids, 59-60, 767-74 (1983).
7. T. Toyama, T. Matsui, Y. Kurokawa, H. Okamoto and Y. Hamakawa, Appl. Phys. Lett., 69, 1261-63 (1996).
8. J. Meier, R. Fluckiger and A. Shah, Appl. Phys. Lett., 65, 860-62 (1994).
9. S. Ishihara, D. He, T. Akasaka, Y. Araki and I. Shimizu, Mater. Res. Soc. Symp. Proc., 297, 79-89 (1993).
10. D. He, N. Okada and I. Shimizu, Sol. Energy Mater. Sol. Cells, 34, 271-76 (1994).
11. M. Nakata and I. Shimizu, Mater. Res. Soc. Symp. Proc., 283, 591-96 (1993).
12. K. Nakahata, A. Miida, T. Kamiya, Y. Maeda, C. M. Fortmann and I. Shimizu, Jpn. J. Appl. Phys. Lett., 37, L1026-29 (1998).
13. T. Kamiya, K. Nakahata, A. Miida, C. M. Fortmann and I. Shimizu, Thin Solid Films, 337, 18-22 (1999).
14. T. Kamiya, K. Nakahata, K. Ro, C. M. Fortmann and I. Shimizu, Jpn. J. Appl. Phys. (1999) in print.
15. T. Nagahara, K. Fujimoto, N. Kohno, Y. Kashiwagi and H. Kakinoki, Jpn. J. Appl. Phys., 318, 4555-58 (1992).
16. M. Azuma, T. Yokoi and I. Shimizu, Mater. Res. Soc. Symp. Proc., 507, 517-22 (1994).