Micro-etching technology of high aspect ratio frameworks for electronic devices

Materials Science and Engineering B

Volumn 64, Issue 2, 1999, Pages 79-83

  Cho, Young Rae ^a   Oh, Jae Yeol ^a   Kim, Heui Soo ^a   Jeong, Hyo Soo ^b  

^a Institute for Advanced Engineering (IAE)   (South Korea)

^b Ajou University   (South Korea)

Author keywords

Electronic device; MEMS; Photoetchable glass; Photolithography

Indexed keywords

ELECTRIC INSULATING MATERIALS; ETCHING; HEAT TREATMENT; MASKS; MECHANICAL PROPERTIES; MICROELECTRONIC PROCESSING; PHOTOLITHOGRAPHY; SURFACES; ULTRAVIOLET RADIATION;

HIGH ASPECT RATIO; MICRO ETCHING TECHNOLOGY; PHOTOETCHABLE GLASS; ULTRASONIC AGITATION; VACUUM ELECTRONIC DEVICES;

SEMICONDUCTING GLASS;

EID: 0033195442     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(99)00158-0     Document Type: Article

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