XPS and XPS valence band characterizations of amorphous or polymeric silicon based thin films prepared by PACVD from organosilicon monomers

Journal De Physique. IV : JP

Volumn 9 pt 2, Issue 8, 1999, Pages

  Berjoan, R ^a   Biche, E ^a   Perarnau, D ^a   Roualdes, S ^b   Durand, J ^b  

^a Centre National de la Recherche Scientifique   (France)

^b CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ARGON; COMPOSITION; ELECTRON ENERGY LEVELS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MONOMERS; NUCLEAR MAGNETIC RESONANCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYMERS; SILICON COMPOUNDS; SPUTTERING; X RAY PHOTOELECTRON SPECTROSCOPY;

INORGANIC AMORPHOUS MATERIALS; ORGANOSILICON MONOMERS; POLYMERIC SILICON; SILOXANE LIKE PLASMA POLYMERS; VALENCE BAND SPECTRA;

THIN FILMS;

EID: 0033188038     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:19998132     Document Type: Article

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